PB

Peter De Bisschop

AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
CA Cameca: 1 patents #10 of 23Top 45%
IM Imec: 1 patents #297 of 687Top 45%
IV Interuniversitair Micro-Electronica Centrum Vzw: 1 patents #167 of 450Top 40%
SO Sony: 1 patents #17,262 of 25,231Top 70%
Overall (All Time): #2,080,490 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
8572522 Illumination-source shape definition in optical lithography Kazuya Iwase 2013-10-29
4912325 Method for sample analysis by sputtering with a particle beam, and device to implement said method Wielfried Vandervorst, Bernard Rasser 1990-03-27