KO

Kazuhisa Onozawa

AK Asahi Denka Kogyo: 3 patents #18 of 196Top 10%
AD Adeka: 1 patents #257 of 499Top 55%
AC Asahi Denka Co.: 1 patents #4 of 40Top 10%
AK Asahi Denka Kogyo K.K.: 1 patents #47 of 162Top 30%
Overall (All Time): #868,448 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
7737291 Composition containing siloxane compound and phenol compound Kunio Osasawara, Hiroki Sato, Takashi Higashino 2010-06-15
6743933 Process of forming thin film and precursor for chemical vapor deposition Atsuya Yoshinaka, Naoki Yamada, Atsushi Sakurai 2004-06-01
6547863 Metal compound solution and thin film formation using the same Naoki Yamada 2003-04-15
6429325 Copper material for chemical vapor deposition and process for forming thin film using the same Toshiya Shingen 2002-08-06
6316064 Process of producing a ruthenium or ruthenium oxide thin film Akifumi Masuko, Toshiya Shingen 2001-11-13
5855651 Method for processing waste gas exhausted from chemical vapor and deposition equipment Naoyasu Kurita, Takayoshi Azumi, Tsuyoshi Watanabe, Mitsutoshi Sasajima, Naoki Yamada 1999-01-05