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Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
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Enhanced edge resolution and critical dimension linearity in lithography |
Jerry Martyniuk, H. Christopher Hamaker |
2004-11-16 |
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Pattern generation method and apparatus using cached cells of hierarchical data |
Asher Klatchko, Robert Sills |
2004-11-02 |
| 5959606 |
Rasterizer for pattern generator |
Allan L. Goodman, Morris H. Green, Robin L. Teitzel, John L. Wipfli |
1999-09-28 |
| 5533170 |
Rasterizer for a pattern generation apparatus |
Robin L. Teitzel, James B. Campbell, Richard K. George, John L. Wipfli |
1996-07-02 |
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Laser pattern generation apparatus |
Paul C. Allen, Robin L. Teitzel, Michael L. Rieger, Michael Bohan, Timothy N. Thomas |
1995-01-31 |
| 4879605 |
Rasterization system utilizing an overlay of bit-mapped low address resolution databases |
Paul Warkentin, Michael L. Rieger, Chris A. Michalski |
1989-11-07 |
| 4806921 |
Rasterizer for pattern generator |
Allan L. Goodman, Morris H. Green, Robin L. Teitzel, John L. Wipfli |
1989-02-21 |