Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5637351 | Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter | Harry E. O'Neal, Morey A. Ring | 1997-06-10 |
| 5494758 | Article manufactured by an ion-beam-assisted-deposition process | Ghawamedin Bayan, Roger A. Cassell | 1996-02-27 |
| 5108792 | Double-dome reactor for semiconductor processing | Roger N. Anderson, Douglas Meyer, Daniel David West, Russell Bowman, David V. Adams | 1992-04-28 |
| 4579080 | Induction heated reactor system for chemical vapor deposition | Walter C. Benzing, Robert Graham | 1986-04-01 |
| 4322592 | Susceptor for heating semiconductor substrates | — | 1982-03-30 |