Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5786276 | Selective plasma etching of silicon nitride in presence of silicon or silicon oxides using mixture of CH3F or CH2F2 and CF4 and O2 | Cynthia B. Brooks, Walter R. Merry, Ajey M. Joshi, Jitske Trevor | 1998-07-28 |