LF

Laura Faulk

AM AMD: 2 patents #3,994 of 9,279Top 45%
Overall (All Time): #2,151,814 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7456110 Method and apparatus for controlling etch selectivity Jeremy Lansford 2008-11-25
6328905 Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip Joseph Lebowitz 2001-12-11