Issued Patents All Time
Showing 26–28 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6153514 | Self-aligned dual damascene arrangement for metal interconnection with low k dielectric constant materials and nitride middle etch stop layer | Fei Wang, Todd P. Lukanc | 2000-11-28 |
| 6107208 | Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry | Fei Wang | 2000-08-22 |
| 6086777 | Tantalum barrier metal removal by using CF.sub.4 /o.sub.2 plasma dry etch | Fei Wang | 2000-07-11 |