Issued Patents 2025
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12255047 | Embedded high-z marker material and process for alignment of multilevel ebeam lithography | Christopher David Bohn, Maxwell Choi, Melanie S. Yajima, Sieu Ha, Clayton Jackson +2 more | 2025-03-18 |