Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12356699 | Method for forming semiconductor device structure with second spacer over second sidewall of fin structure | — | 2025-07-08 |
| 12237390 | Low resistance contact feature | Wei-Yuan Lu, Wei-Yang Lee, Chia-Pin Lin, Tzu-Wei Kao | 2025-02-25 |