Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12324208 | Method for manufacturing semiconductor device including annealing treatment of inner spacer layer | Yoh-Rong Liu, Wen-Kai Lin, Che-Hao Chang, Chi On Chui, Yung-Cheng Lu +1 more | 2025-06-03 |
| 12266574 | Flowable chemical vapor deposition (FCVD) using multi-step anneal treatment and devices thereof | Yun Chen Teng, Chen-Fong Tsai, Huicheng Chang, Yee-Chia Yeo | 2025-04-01 |