Issued Patents 2025
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429772 | Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound | Keiichi Masunaga, Kenji Funatsu, Naoya Inoue | 2025-09-30 |