Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429772 | Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound | Keiichi Masunaga, Masaaki Kotake, Naoya Inoue | 2025-09-30 |
| 12271112 | Negative resist composition and pattern forming process | Jun Hatakeyama, Naoya Inoue | 2025-04-08 |