Issued Patents 2025
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12386262 | Resist underlayer film-forming composition using carbon-oxygen double bond | Hikaru TOKUNAGA, Hiroto OGATA, Keisuke Hashimoto | 2025-08-12 |
| 12372875 | Composition for resist pattern metallization process | Wataru SHIBAYAMA, Satoshi Takeda, Shuhei Shigaki, Ken ISHIBASHI, Kodai KATO | 2025-07-29 |
| 12360452 | Resist underlayer film-forming composition | Hikaru TOKUNAGA, Hayato HATTORI | 2025-07-15 |
| 12332566 | Resist underlayer film-forming composition | Hiroto OGATA, Tomotada HIROHARA, Keisuke Hashimoto, Takahiro Kishioka | 2025-06-17 |
| 12313972 | Resist underlayer film-forming composition | Hiroto OGATA, Hirokazu Nishimaki, Yuki MITSUTAKE, Hayato HATTORI | 2025-05-27 |
| 12248251 | Silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Wataru SHIBAYAMA, Hayato HATTORI, Ken ISHIBASHI | 2025-03-11 |
| 12227621 | Film-forming composition | Wataru SHIBAYAMA, Yuichi Goto, Shun KUBODERA, Satoshi Takeda, Ken ISHIBASHI | 2025-02-18 |