Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12393115 | Positive working photosensitive material | PingHung Lu, Chunwei Chen | 2025-08-19 |
| 12276909 | Novolak/DNQ based, chemically amplified photoresist | Medhat A. Toukhy, Takanori Kudo, Hung-Yang Chen, Jian Yin | 2025-04-15 |