Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360453 | PAG-free positive chemically amplified resist composition and methods of using the same | Hung-Yang Chen | 2025-07-15 |
| 12276909 | Novolak/DNQ based, chemically amplified photoresist | Medhat A. Toukhy, Weihong Liu, Hung-Yang Chen, Jian Yin | 2025-04-15 |