Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12315732 | Method and apparatus for etching a semiconductor substrate in a plasma etch chamber | Daisuke Shimizu, Li Ling, Hikaru Watanabe | 2025-05-27 |
| 12278110 | Bias voltage modulation approach for SiO/SiN layer alternating etch process | Sean S. Kang, Olivier Luere, Sanghyuk CHOI, Mengnan ZOU, Zihao Ding | 2025-04-15 |