Issued Patents 2025
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347650 | Substrate processing system including dual ion filter for downstream plasma | Andrew Stratton Bravo, Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon +3 more | 2025-07-01 |
| 12272570 | Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead | Dengliang Yang, Haoquan Fang, David Cheung, Gnanamani Amburose, Eunsuk Ko +1 more | 2025-04-08 |
| 12272571 | Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead | Dengliang Yang, Haoquan Fang, David Cheung, Gnanamani Amburose, Eunsuk Ko +1 more | 2025-04-08 |
| 12211709 | Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead | Dengliang Yang, Haoquan Fang, David Cheung, Gnanamani Amburose, Eunsuk Ko +1 more | 2025-01-28 |