Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334314 | Dry etcher uniformity control by tuning edge zone plasma sheath | Po-Lung HUNG, Yi-Tsang Hsieh, Yu-Hsi TANG, Chih-Teng Liao | 2025-06-17 |
| 12205844 | Plasma control method in semiconductor wafer fabrication | Huang-Shao Ko, Jui Fu Hsieh, Chih-Teng Liao | 2025-01-21 |