OZ

Olger Victor Zwier

AB Asml Netherlands B.V.: 2 patents #71 of 589Top 15%
Overall (2025): #96,806 of 469,880Top 25%
2
Patents 2025

Issued Patents 2025

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
12276921 Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method Maurits Van Der Schaar, Hilko Dirk Bos, Hans Van Der Laan, S. M. Masudur Rahman Al Arif, Henricus Wilhelmus Maria Van Buel +6 more 2025-04-15
12242203 Target for measuring a parameter of a lithographic process Maurits Van Der Schaar, Patrick Warnaar, Franciscus Godefridus Casper Bijnen 2025-03-04