Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12147155 | Mask correction method, mask correction device for double patterning and training method for layout machine learning model | Min-Cheng Yang | 2024-11-19 |
| 11934106 | Optical proximity correction device and method | Shu-Yen Liu, Hui-Fang Kuo, Chian-Ting Huang, Wei-Cyuan Lo, Yung-Feng Cheng | 2024-03-19 |
| 11927887 | OPC operation method and OPC operation device | Guo-Xin Hu, Yuh-Kwei Chao | 2024-03-12 |