Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12147155 | Mask correction method, mask correction device for double patterning and training method for layout machine learning model | Chung-Yi Chiu | 2024-11-19 |
| 11977335 | Pattern decomposition method | Wei-Cyuan Lo, Yung-Feng Cheng | 2024-05-07 |