Issued Patents 2024
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12113120 | Gate electrode having a work-function layer including materials with different average grain sizes | Ru-Shang Hsiao, Ching-Hwanq Su, Pin Chia Su, Ling-Sung Wang | 2024-10-08 |
| 12027609 | Gate structure of semiconductor device and method of forming same | Ru-Shang Hsiao, Ying Wang | 2024-07-02 |
| 12021130 | Circuit structure with gate configuration | Ru-Shang Hsiao, Ching-Hwanq Su, Pin Chia Su, Ling-Sung Wang | 2024-06-25 |
| 11961891 | Structure for metal gate electrode and method of fabrication | Ru-Shang Hsiao, Ching-Hwanq Su, Pohan Kung, I-Shan Huang | 2024-04-16 |
| 11949000 | Metal gate structures and methods of fabricating the same in field-effect transistors | Ru-Shang Hsiao, Ching-Hwanq Su, Pin Chia Su, I-Shan Huang | 2024-04-02 |