Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12032289 | Polymer, chemically amplified resist composition and patterning process | Masahiro Fukushima, Emiko Ono | 2024-07-09 |
| 12013639 | Positive resist material and patterning process | Jun Hatakeyama, Naoki Ishibashi | 2024-06-18 |