MF

Masahiro Fukushima

SC Shin-Etsu Chemical Co.: 4 patents #23 of 258Top 9%
MC Murata Manufacturing Co.: 1 patents #477 of 1,088Top 45%
Canon: 1 patents #1,281 of 3,292Top 40%
📍 Joetsu, JP: #4 of 64 inventorsTop 7%
Overall (2024): #23,584 of 561,600Top 5%
6
Patents 2024

Issued Patents 2024

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
12183645 Electronic component including protective layer Kazunori Inoue, Shintaro Otsuka, Koichiro Kawasaki, Hidefumi Nakanishi, Masakazu Atarashi 2024-12-31
12060317 Onium salt, chemically amplified negative resist composition, and pattern forming process Satoshi Watanabe, Ryosuke Taniguchi, Naoya Inoue 2024-08-13
12042261 Imaging support apparatus, magnetic resonance imaging apparatus, and imaging support method 2024-07-23
12032289 Polymer, chemically amplified resist composition and patterning process Masayoshi Sagehashi, Emiko Ono 2024-07-09
11953827 Molecular resist composition and patterning process Masaki Ohashi, Kazuhiro Katayama 2024-04-09
11940728 Molecular resist composition and patterning process Masaki Ohashi, Kazuhiro Katayama, Shun Kikuchi 2024-03-26