Issued Patents 2024
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12158700 | Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus | Hirokazu Sakakibara, Naoki Nishiguchi, Tomoyuki Matsumoto | 2024-12-03 |
| 12092957 | Radiation-sensitive resin composition, method for forming resist pattern and compound | Kazuya KIRIYAMA, Katsuaki NISHIKORI, Ryuichi NEMOTO, Ken MARUYAMA | 2024-09-17 |
| 11966161 | Radiation-sensitive resin composition, method of forming resist pattern, and compound | Katsuaki NISHIKORI, Hayato Namai, Kazuya KIRIYAMA, Ken MARUYAMA | 2024-04-23 |