Issued Patents 2024
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11988959 | Organometallic solution based high resolution patterning compositions and corresponding methods | Stephen T. Meyers, Jeremy T. Anderson, Joseph B. Edson, Kai-Li Jiang, Douglas A. Keszler +2 more | 2024-05-21 |
| 11988961 | Radiation based patterning methods | Jason K. Stowers, Douglas A. Keszler, Andrew Grenville | 2024-05-21 |
| 11947262 | Process environment for inorganic resist patterning | Jason K. Stowers, Douglas A. Keszler, Stephen T. Meyers, Peter De Schepper, Sonia Castellanos Ortega +2 more | 2024-04-02 |
| 11886116 | Multiple patterning with organometallic photopatternable layers with intermediate freeze steps | Peter De Schepper, Jason K. Stowers, Sangyoon Woo, Michael Kocsis | 2024-01-30 |