KT

Kwadwo E. Tettey

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #7 of 26Top 30%
📍 Newark, DE: #18 of 78 inventorsTop 25%
🗺 Delaware: #175 of 650 inventorsTop 30%
Overall (2023): #359,358 of 537,848Top 70%
1
Patents 2023

Issued Patents 2023

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11772230 Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith Jing-Fei Ren, Bryan E. Barton 2023-10-03