Issued Patents 2023
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11845156 | Polishing pad employing polyamine and cyclohexanedimethanol curatives | Rui Ma, Lin Fu, Jaeseok Lee, Sarah Brosnan | 2023-12-19 |
| 11845157 | Chemical mechanical planarization pads via vat-based production | Eric Scott Moyer, Lin Fu, William Michael Spitzig, Ping Huang, Justin Stewart +1 more | 2023-12-19 |
| 11807710 | UV-curable resins used for chemical mechanical polishing pads | Eric Scott Moyer, Ping Huang | 2023-11-07 |