Issued Patents 2022
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11401441 | Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications | Xiaobo Shi, Laura M. Matz, Ming-Shih Tsai, Pao-Chia Pan, Chad Chang-Tse Hsieh +4 more | 2022-08-02 |