Issued Patents 2022
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11472821 | Precursor compounds for atomic layer deposition (ALD) and chemical vapor deposition (CVD) and ALD/CVD process using the same | Jung Wun HWANG, Ki-Yeung Mun, Kyu Hyun Yeom, Jang-Hyeon Seok, Jung-Woo Park | 2022-10-18 |