Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11480877 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | Takumi TOIDA, Masatoshi Echigo, Takashi Sato | 2022-10-25 |
| 11256170 | Compound, resist composition, and method for forming resist pattern using it | Takumi TOIDA, Masatoshi Echigo, Takashi Sato | 2022-02-22 |
| 11243467 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Takashi MAKINOSHIMA, Takashi Sato, Masatoshi Echigo | 2022-02-08 |