Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11480877 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2022-10-25 |
| 11256170 | Compound, resist composition, and method for forming resist pattern using it | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2022-02-22 |
| 11243467 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato | 2022-02-08 |