Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11524390 | Methods of making chemical mechanical polishing layers having improved uniformity | Bainian Qian, George C. Jacob, Andrew Wank, David Shidner, Kancharla-Arun Kumar Reddy +1 more | 2022-12-13 |
| 11396081 | Chemical mechanical polishing pad | Bainian Qian | 2022-07-26 |