DS

David Shidner

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #9 of 24Top 40%
📍 Newark, DE: #16 of 97 inventorsTop 20%
🗺 Delaware: #173 of 608 inventorsTop 30%
Overall (2022): #478,716 of 548,613Top 90%
1
Patents 2022

Issued Patents 2022

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11524390 Methods of making chemical mechanical polishing layers having improved uniformity Bainian Qian, George C. Jacob, Andrew Wank, Kancharla-Arun Kumar Reddy, Donna M. Alden +1 more 2022-12-13