YY

Yi Yang

TSMC: 10 patents #179 of 3,494Top 6%
HT Headway Technologies: 2 patents #9 of 54Top 20%
📍 Fremont, CA: #22 of 1,880 inventorsTop 2%
🗺 California: #733 of 66,859 inventorsTop 2%
Overall (2021): #4,393 of 548,734Top 1%
13
Patents 2021

Issued Patents 2021

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11145809 Multiple spacer assisted physical etching of sub 60nm MRAM devices Dongna Shen, Yu-Jen Wang 2021-10-12
11137178 Cold energy recovery-type variable-capacity air-source heat pump system Yunyun Wu, Yujun Wang, Ying Wang, Junhong Li, Tianshu Wang 2021-10-05
11121314 Large height tree-like sub 30nm vias to reduce conductive material re-deposition for sub 60nm MRAM devices Dongna Shen, Yu-Jen Wang 2021-09-14
11088321 Highly selective ion beam etch hard mask for sub 60nm MRAM devices Dongna Shen, Yu-Jen Wang 2021-08-10
11088320 Fabrication of large height top metal electrode for sub-60nm magnetoresistive random access memory (MRAM) devices Zhongjian Teng, Jesmin Haq, Yu-Jen Wang 2021-08-10
11081642 MTJ CD variation by HM trimming Dongna Shen, Jesmin Haq, Yu-Jen Wang 2021-08-03
11043632 Ion beam etching process design to minimize sidewall re-deposition Vignesh Sundar, Guenole Jan, Dongna Shen, Yu-Jen Wang 2021-06-22
11031548 Reduce intermixing on MTJ sidewall by oxidation Dongna Shen, Sahil Patel, Vignesh Sundar, Yu-Jen Wang 2021-06-08
11024797 Under-cut via electrode for sub 60 nm etchless MRAM devices by decoupling the via etch process Dongna Shen, Yu-Jen Wang 2021-06-01
10964887 Highly physical ion resistive spacer to define chemical damage free sub 60nm MRAM devices Dongna Shen, Yu-Jen Wang 2021-03-30
10944049 MTJ device performance by controlling device shape Jesmin Haq, Tom Zhong, Zhongjian Teng, Vinh Lam 2021-03-09
10921707 Self-adaptive halogen treatment to improve photoresist pattern and magnetoresistive random access memory (MRAM) device uniformity Dongna Shen, Jesmin Haq, Yu-Jen Wang 2021-02-16
10886461 Highly physical etch resistive photoresist mask to define large height sub 30nm via and metal hard mask for MRAM devices Dongna Shen, Yu-Jen Wang 2021-01-05