Issued Patents 2021
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11145809 | Multiple spacer assisted physical etching of sub 60nm MRAM devices | Yi Yang, Yu-Jen Wang | 2021-10-12 |
| 11121314 | Large height tree-like sub 30nm vias to reduce conductive material re-deposition for sub 60nm MRAM devices | Yi Yang, Yu-Jen Wang | 2021-09-14 |
| 11088321 | Highly selective ion beam etch hard mask for sub 60nm MRAM devices | Yi Yang, Yu-Jen Wang | 2021-08-10 |
| 11081642 | MTJ CD variation by HM trimming | Yi Yang, Jesmin Haq, Yu-Jen Wang | 2021-08-03 |
| 11043632 | Ion beam etching process design to minimize sidewall re-deposition | Vignesh Sundar, Guenole Jan, Yi Yang, Yu-Jen Wang | 2021-06-22 |
| 11031548 | Reduce intermixing on MTJ sidewall by oxidation | Yi Yang, Sahil Patel, Vignesh Sundar, Yu-Jen Wang | 2021-06-08 |
| 11024797 | Under-cut via electrode for sub 60 nm etchless MRAM devices by decoupling the via etch process | Yi Yang, Yu-Jen Wang | 2021-06-01 |
| 10964887 | Highly physical ion resistive spacer to define chemical damage free sub 60nm MRAM devices | Yi Yang, Yu-Jen Wang | 2021-03-30 |
| 10921707 | Self-adaptive halogen treatment to improve photoresist pattern and magnetoresistive random access memory (MRAM) device uniformity | Yi Yang, Jesmin Haq, Yu-Jen Wang | 2021-02-16 |
| 10886461 | Highly physical etch resistive photoresist mask to define large height sub 30nm via and metal hard mask for MRAM devices | Yi Yang, Yu-Jen Wang | 2021-01-05 |