Issued Patents 2021
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11201084 | Fin field-effect transistor device and method of forming the same | Chieh-Wei Chen, Jian-Jou Lian, Chun-Neng Lin, Tzu-Ang Chiang | 2021-12-14 |
| 11195752 | Semiconductor device and method of forming same | Yu-Shih Wang, Kuo-Bin Huang, Po-Nan Yeh | 2021-12-07 |
| 11189714 | Gate stack structure and method for forming the same | Ming-Chi Huang, Ying-Liang Chuang, Kuo-Bin Huang | 2021-11-30 |
| 11158726 | Controlling fin-thinning through feedback | Tsu-Hui Su, Chun-Hsiang Fan, Yu-Wen Wang, Kuo-Bin Huang | 2021-10-26 |
| 11133200 | Substrate vapor drying apparatus and method | Chun-Liang Tai, Chun-Hsiang Fan, Kuo-Bin Huang | 2021-09-28 |
| 11114436 | Metal gate structure and methods thereof | Ming-Chi Huang, Ying-Liang Chuang, Kuo-Bin Huang | 2021-09-07 |
| 11114347 | Self-protective layer formed on high-k dielectric layers with different materials | Ju-Li Huang, Ying-Liang Chuang, Kuo-Bin Huang | 2021-09-07 |
| 11101135 | Semiconductor device and method of manufacture | Jian-Jou Lian, Li-Min Chen, Neng-Jye Yang, Shun Wu Lin, Kuo-Bin Huang | 2021-08-24 |
| 11031500 | Gate resistance improvement and method thereof | Ju-Li Huang, Chun-Sheng Liang, Ying-Liang Chuang, Hsin-Che Chiang, Chun-Ming Yang +1 more | 2021-06-08 |
| 11031302 | High-k metal gate and method for fabricating the same | Ju-Li Huang, Chih-Long Chiang, Kuo-Bin Huang, Ying-Liang Chuang | 2021-06-08 |
| 10937656 | Self-protective layer formed on high-k dielectric layer | Ju-Li Huang, Ying-Liang Chuang, Kuo-Bin Huang | 2021-03-02 |