Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143962 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Takumi TOIDA, Takashi Sato, Masatoshi Echigo | 2021-10-12 |
| 11137686 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Takumi TOIDA, Takashi Sato, Masatoshi Echigo | 2021-10-05 |