Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143962 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Takumi TOIDA, Takashi MAKINOSHIMA, Takashi Sato | 2021-10-12 |
| 11137686 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Takumi TOIDA, Takashi MAKINOSHIMA, Takashi Sato | 2021-10-05 |
| 11130724 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | Takumi TOIDA, Takashi Sato | 2021-09-28 |
| 11067889 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | — | 2021-07-20 |