Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11101357 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2021-08-24 |
| 11056398 | Forming interconnect without gate cut isolation blocking opening formation | Daniel Jaeger, Naved Siddiqui, Shimpei Yamaguchi | 2021-07-06 |