CL

Chung-Hsun Lin

TE Tessera: 1 patents #27 of 70Top 40%
Overall (2021): #498,456 of 548,734Top 95%
1
Patents 2021

Issued Patents 2021

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11101357 Asymmetric high-k dielectric for reducing gate induced drain leakage Anthony I. Chou, Arvind Kumar, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw 2021-08-24