Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11187973 | Reflective EUV mask absorber manipulation to improve wafer contrast | Yudhishthir Prasad Kandel | 2021-11-30 |
| 11093680 | Design-prioritized mask correction | Frank L. Ferschweiler | 2021-08-17 |
| 10915031 | Optical source compensation | — | 2021-02-09 |