Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11180719 | Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Daniel LOEFFLER, Mei Chin SHEN, Sheng-Hsuan Wei, Frank Oliver Heinrich Pirrung, Yeni Burk +3 more | 2021-11-23 |