Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11180719 | Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Daniel LOEFFLER, Mei Chin SHEN, Sheng-Hsuan Wei, Lothar Alexander Engelbrecht, Yeni Burk +3 more | 2021-11-23 |
| 11053334 | Monomers and polymers | Huiguang Kou, Clemens Auschra, Dario Perera-Diez | 2021-07-06 |