Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11126090 | Model for calculating a stochastic variation in an arbitrary pattern | — | 2021-09-21 |
| 11029594 | Optimization of a lithography apparatus or patterning process based on selected aberration | Kateryna Stanislavovna Lyakhova, Paulus Jacobus Maria VAN ADRICHEM | 2021-06-08 |