Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE48304 | Source and drain dislocation fabrication in FinFETs | Zhiqiang Wu, Wen-Hsing Hsieh, Hua Feng Chen, Ting-Yun Wu, Carlos H. Diaz +1 more | 2020-11-10 |
| 10804163 | Method of metal gate formation and structures formed by the same | Yi-Jing Lee, Hau-Yu Lin, I-Sheng Chen, Chia-Ming Hsu, Chih-Hsin Ko +1 more | 2020-10-13 |