Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10811225 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Pei-Yi Liu, Shy-Jay Lin, Burn Jeng Lin | 2020-10-20 |