Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10734436 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Wei-Chao Chiu, Chih-Chien Wang, Feng-Jia Shiu, Chun-Wei Chang, Kai-Meng Tzeng | 2020-08-04 |
| 10546889 | Method of high-aspect ratio pattern formation with submicron pixel pitch | Wei-Chao Chiu, Chih-Chien Wang, Feng-Jia Shiu, Chun-Wei Chang, Kai-Meng Tzeng | 2020-01-28 |