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RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 40Top 50%
📍 Xi'an, DE: #1 of 1 inventorsTop 100%
Overall (2020): #201,144 of 565,922Top 40%
1
Patents 2020

Issued Patents 2020

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10711158 Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them Naresh Kumar Penta 2020-07-14