Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10620534 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2020-04-14 |
| 10564546 | Resist pattern-forming method | Tomohiko SAKURAI, Sousuke Oosawa, Kousuke Terayama | 2020-02-18 |